Major chipmakers have committed to ASML's initiative to transition from 6-inch to 12-inch photomasks, forming the Large Mask Consortium to address throughput limitations in high-NA EUV lithography systems. The move aims to eliminate stitching constraints that currently prevent the newest machines from printing the largest AI chips.
China has reportedly begun manufacturing domestically developed immersion deep ultraviolet (DUV) lithography machines, a key chipmaking tool long dominated by Dutch supplier ASML, as it seeks to reduce reliance on foreign semiconductor technology.
Dutch chip equipment maker ASML announced it will grant all employees a one-time €20,000 restricted stock award vesting in 2030, contingent on continued employment. The bonus follows the company raising its full-year sales outlook to €43-45 billion as AI demand drives record chip equipment orders.
US Commerce Secretary Howard Lutnick met with ASML leadership to express concerns that one of the company's top-tier extreme ultraviolet (EUV) lithography machines may have reached China. ASML has denied ever shipping EUV equipment to China.
